Privacy Policy

Privacy Policy:

At Nairobi Summer School, we are committed to protecting the privacy and personal information of our website visitors and program participants. This Privacy Policy outlines how we collect, use, and safeguard your personal data.

  1. Collection of Personal Information:
  • We may collect personal information, such as your name, email address, contact number, and educational background when you submit an application or contact us through our website.
  • We may also collect non-personal information, such as browser type, IP address, and device information, to enhance your browsing experience.
  1. Use of Personal Information:
  • We use the personal information you provide to process your application, communicate with you, and deliver the services you have requested.
  • We may also use your information to send you updates, newsletters, and promotional materials related to Nairobi Summer School, unless you choose to opt out.
  1. Data Security:
  • We implement strict security measures to protect your personal information from unauthorized access, alteration, or disclosure.
  • We restrict access to your personal data to authorized personnel only and ensure that all third-party service providers comply with adequate data protection measures.
  1. Data Retention:
  • We retain your personal information for as long as necessary to fulfill the purposes outlined in this Privacy Policy or as required by law.
  • If you wish to request the deletion of your personal data, please contact us using the information provided below.
  1. Third-Party Links:
  • Our website may contain links to third-party websites. We are not responsible for the privacy practices or content of these external sites. We encourage you to review their respective privacy policies before providing any personal information.
  1. Updates to Privacy Policy:
  • We may update our Privacy Policy from time to time. Any changes will be posted on this page, and the revised version will become effective immediately upon posting.